
Name
of the equipment:
RF Sputtering
Make
& Model:
HIND HIGH
VACUUM AUTO 500, D1307
I-Stem
Registration ID-
………………………
Category
of Instrument
Sample Preparation
Types
of Analysis / Testing
Sample Preparation
Application:
1.
Coating (Thin Films)
2.
Semiconductor
Industries
3.
Biological / Polymer sample coating
Description of Instrument
RF
sputtering is a physical vapor deposition (PVD) technique used to
deposit thin films. It involves bombarding a target material with
energetic ions, which then dislodge atoms that deposit on a substrate to
form a thin film. RF sputtering utilizes radio frequency (RF) power to
create and maintain a plasma, accelerating ions that impact the target
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